For details and submission: http://2014biennial.fotofest.org/2016/submissions.aspx#.VJMG_Z2DMg
FotoFest’s 2016 Biennial of Photography and New Media Art will be FotoFest’s sixteenth consecutive Biennial. Over 1,000 photographic and new media artists exhibited works during the 2014 Biennial, and overall attendance was 275,000 people. Curators, artists, collectors, publishers, critics and arts audiences from over 32 countries attended the Biennial.
The FotoFest 2016 Biennial takes place March 12-April 24, 2016.